It is applied in the HT and deposition machine as the process gas channel. It's the critical component in the HT and deposition process
Technical Superiority

1.Adopt integrated drilling process

2.Realize customized processing of any length.(3-14mm aperture)

3.High purity of raw materials.

4. High metal contamination control to meet the requirements of the silicon wafer treatment process

5.Same coefficient of the thermal expansion

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