Si Fin is applied in the high-temperature furnace. It's mounted on the base of the insulated barrel with pillars. As the wet-oxygen process requirements, it's effectively way to provent water drops impacts to the process and devices by adjusting the fin quntity. And also to avoid the damage to the sealing components caused by high process temperature
Technical Superiority

1.Mono-crystalline material with high purity

2. Self-developed cleaning technology, the surface metal ion residue meets the requirements of silicon wafer treatment process

3.Mature processing process

XML 地图